






The best yield solution for all kinds of substrate edge polishing.
Our unique polishing technology by using abrasive tapes realizes constantly polishing capability with a new abrasive surface without being clogging, in various materials of wafer edge (beveling/notch/top edge) polishing.
-Sales record of over 200 wafer edge polisher all over the world.
-Applicable for various sizes, from half-inch to 450mm wafer.
-Proven edge processes such as beveling and polishing (controling surface roughness) and forming the edge shape (preventing the shape of knife edge).
-Superior removing method of films (insulation films, metal films) and organic substances such as resins, residues, etc. on the edge.
-High-efficiency with low damage beveling and polishing of SiC wafers.





Si,SiC,GaN,InP,GaP,GaAs,Ga2O3,GaSb,ZnS,ZnTe,GaNonSi,GaNonSiC,SiConSi,SiConSiC,AlN,Si3N4,Al2O3,ZrO2,BaTiO3,PZT,Si,Al2O3/YAGeutectic,LiTaO3(LT),LiNbO3(LN),glass
Oxide film, Nitride film, Epitaxial film, Au film, Cu film, Al film
Mipox, the polishing professional, will propose the best polishing solutions, materials, and tools to meet your needs.
Please feel free to contact us.

