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As well as general RCA cleaning (SC-1, SC-2, SPM), we can meet a variety of cleaning needs - including not only physical cleaning methods such as scrub cleaning and two-fluid cleaning using special cleaning agents manufactured in-house and two-fluid cleaning but also solvent cleaning for such purpose as surface protection resist removal.
Single-Wafer Cleaning
(Two-Fluid Nozzle Cleaning)
Single-Wafer Cleaning
(PVA Sponge Brush Cleaning)
Double-Sided Scrub Cleaning - Cleaning in Progress
Single-Sheet Wafer Cleaner
Double-Sided Full Auto Double-Sided Scrub Cleaner
Double-Sided Scrub Wafer Cleaner
Compatible Materials: We handle a wide range of materials, including chip-shaped wafers as well as SEMI-standard wafers.
Supported Sizes: 2 to 8 inches, 12 inches
*Applicable cleaning methods differ for each wafer size. Feel free to consult us.
We are expanding our precision cleaning agent manufacturing technology for the electronics industry, which we have cultivated mainly for HDD manufacturing applications, into polishing services.
Dedicated cleaning detergents for compound semiconductor wafers such as GaN and AlN that are not suitable for RCA cleaning (chemical cleaning alters the surface) are at the top of our list, followed by dedicated cleaning detergents that work effectively when combined with wafer materials and dedicated slurries used in polishing processes, and cleaning detergents that achieve surface properties suitable for subsequent processes such as bonding, to name a few - we design and apply dedicated cleaning detergents suitable for individual applications.
We can customize cleaning detergents starting from small quantities for small projects. We also offer flexible support for process transfer projects.
Mipox, the polishing professional, will propose the best polishing solutions, materials, and tools to meet your needs.
Please feel free to contact us.