Diamond Film

Diamond Film

High-quality and highly durable Mipox diamond film demonstrates high polishing capabilities even on difficult-to-cut materials and extensive lineup meets a variety of grinding and polishing needs.

Product Shape

Tape,Sheet,Roll,Disc

Applications

Semiconductor,Hard Disk Drive,Electronics

Product Features

Mipox diamond film is an ideal product for polishing difficult-to-process materials such as hard ceramics and metals by taking advantage of the excellent durability of diamond and maintaining a high polishing rate with excellent cost performance.
The flexibility of the film base makes it possible to polish not only flat surfaces but also curved surfaces and special structures with unevenness.
Mipox is particular about the shape and particle size control of the diamond abrasive grains to bring out the best performance in a variety of applications.
There is a wide lineup ranging from #600 for grinding and coarse polishing to #20,000 for fine finish polishing, the Ra of workpieces on the nanometer order to meet verious needs.

Applications

Mipox diamond films can be applied to the polishing process of various materials.
Diamond polishing films for optical fiber applications are developed mainly for the single core polishing process of resin removal, rough polishing and medium polishing.
It is possible to process the ferrule end surface after resin removal into any shape. There is a wide range of highly durable, high-quality diamond films for fiber optics application to meet customer needs.

Diamond film boasts the highest processing rate and durability of any polishing material, and is also widely used in polishing semiconductor application in polishing metal wiring, insulating films and substrate materials such as Si, SiC, and compound semiconductors.which require high-precision micromachining.
There is a product lineup that is ideal for polishing difficult-to-cut materials from rough polishing to finish polishing such as hard-to-cut materials expected to be the materials for next-generation semiconductors, ceramics, and metals with hard films.

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